Lithography Overview
Lithography is an important step in semiconductor material manufacturing. It uses exposure and development to define geometric patterns in the photoresist layer, and then transfers the pattern from the photomask to the substrate through the etching process. Semicon Global Tech provides MEMS foundry services for universities and research institutes, with experience in multiple lithography technologies.
Applicable Materials
| Silicon wafers, glass, sapphire, flexible materials and other substrates |
Lithography Technologies
| Contact Lithography | Minimum feature size: 1 μm; overlay accuracy: ±0.5 μm |
| Stepper Lithography | Projection ratio 1:5; minimum feature size: 0.35 μm; overlay accuracy ≤0.15 μm (X, Y); exposure range:<22 × 22 mm |
| Electron-Beam Lithography | Minimum feature size: 10 nm; overlay accuracy: 40 nm; exposure range:<Φ100 mm |










