Semicon Global Tech
Lithography
MEMS Foundry Services
MEMS processing
Lithography
Lithography Overview
Lithography is an important step in semiconductor material manufacturing. This process uses exposure and development to define geometric patterns in a photoresist layer, and then transfers the pattern from the photomask to the substrate through etching. Semicon Global Tech provides MEMS foundry services for universities, research institutes and industrial R&D teams, with experience in multiple lithography technologies.
Applicable Materials
Silicon wafers, glass, sapphire and flexible substrates.
Lithography Capabilities
Contact Lithography Minimum feature size: 1 μm; overlay accuracy: ±0.5 μm
Stepper Lithography Projection ratio 1:5; minimum feature size: 0.35 μm; overlay accuracy ≤0.15 μm (X, Y); exposure range: <22 × 22 mm
Electron-Beam Lithography Minimum feature size: 10 nm; overlay accuracy: 40 nm; exposure range:<Φ100 mm
Case Studies
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Lithographyprocess
Lithographyprocess
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