Thin-Film Deposition Services | MEMS and Semiconductor Coatings

Thin-Film Deposition

Thin-Film Deposition Overview

Thin-film deposition is a common surface treatment process. Under vacuum conditions, a metal or non-metal material is deposited onto the surface of a substrate in vapor phase to form a dense thin film. Film quality is critical to the functional formation of semiconductor devices. Semicon Global Tech provides MEMS foundry services and supports multiple thin-film deposition technologies.

Deposition Services

Oxide / nitride films, metal films, optical films, composite films and other customized thin-film deposition services.

Deposition Materials

Metals	Ti, Al, Ni, Au, Ag, Cr, Pt, Cu, Pd, Zn, Mo, W, Ta, Nb and other metal coating materials
Non-metals	Si, SiO₂, SiNₓ, Al₂O₃, HfO₂, MgF₂, Ta₂O₅, ITO and other non-metal coating materials

Deposition Substrates

Substrates	Silicon wafers, quartz glass wafers, sapphire wafers, PET, PI and other substrates
Substrate Size	2–8 inches

Film Thickness and Surface

Thickness	Nanometer-level and micrometer-level thicknesses; customizable on request
Surface	Single-sided or double-sided deposition

Deposition Technologies

Electron-Beam Evaporation	Ti, Al, Ni, Ag, Cu, Cr, Sn, Pt, AuGe
Magnetron Sputtering	Ti, Al, Ni, Au, Ag, Cr, Pt, Cu, TiW90, Pd, Pt, Zn, Mo, W, Ta, Ru, Si, SiC, NiCr20, Nb
LPCVD (Low-Pressure Chemical Vapor Deposition)	SiNₓ, Poly-Si; wafer-level uniformity: <±5%
PECVD (Plasma-Enhanced Chemical Vapor Deposition)	SiO₂, SiNₓ, a-Si (B/P doped)
ALD (Atomic Layer Deposition)	Al₂O₃, HfO₂, AlN, ZrO₂, SiO₂, TiN, TiO₂

Case Studies