Photomasks are important materials used in lithography processes. They are also known in the industry as photomask plates, masks or lithography masks. Common photomask types include quartz substrates, soda-lime glass substrates and film masks.
Photomask Types and Process Capabilities
Photomask Types
Quartz substrate, soda-lime glass substrate, film mask
Process Capability
2.5 inch to 9 inch customization; soda-lime glass mask accuracy ±0.3 μm; quartz mask accuracy ±0.1 μm
